Fluorinated aminoalkoxide Cu complexes: new CVD precursors for deposition of copper metal
نویسندگان
چکیده
Yun Chi,* Peng-Fu Hsu, Chao-Shiuan Liu,* Wei-Li Ching, Tsung-Yi Chou, Arthur J. Carty,* Shie-Ming Peng, Gene-Hsiang Lee and Shiow-Huey Chuang Department of Chemistry, National Tsing Hua University, Hsinchu 30013, Taiwan. E-mail: [email protected] Steacie Institute for Molecular Sciences, National Research Council Canada, 100 Sussex Drive, Ottawa, Ontario, Canada K1A 0R6 Department of Chemistry and Instrumentation Center, National Taiwan University, Taipei 10764, Taiwan National Nano Device Laboratories, Hsinchu 30050, Taiwan
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تاریخ انتشار 2002